Advancing chip fundamentals through material and thermal innovation.
CoolSem’s patented wafer-level thermal management technology helps chips run cooler, last longer, and perform beyond today’s limits.
CoolSem’s patented wafer-level thermal management technology helps chips run cooler, last longer, and perform beyond today’s limits.
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Learn more about our mission
We redefine semiconductor performance through material and thermal innovation.
Watch how our team works on this mission
why heat limits chips
While traditional cooling techniques remove heat from the package or system level, the real challenge lies deeper.
In the thermal resistance of the chip’s substrate.
Active device
Substrate
heatsink
But the challenge goes deeper than heat itself.
As devices cycle through temperature changes, the different materials inside each chip expand and contract at different rates — adding mechanical stress on top of thermal resistance. Over time, this stress degrades interfaces and compounds the very heat problem it’s meant to control.
Our wafer based solution
CoolSem removes the substrate, the barrier to efficient heat flow.
And we replace it with our patented wafer-level carrier that conducts heat up to 15× better.
Active Devices
Substrate
Waltis ®
15× better thermal pathway, zero layout constraints
Our patented WaLTIS® wafer-level technology reduces thermal resistance by up to 15× and eliminates hotspots that degrade device performance and reliability. At the same time, the architecture remains dielectrically neutral — fully compatible with existing device layouts and electrical isolation schemes.
Key application domains
RF Base Stations
The advanced thermal substrate inside tomorrow’s 5G/6G antenna systems — conducting heat like metal, expanding like the die, and ensuring long-term reliability in every outdoor macro and mMIMO array.
SatCom
WaLTIS inside the GaAs power amplifier tiles of next-generation flat-panel user terminals. Replacing the native GaAs substrate, WaLTIS provides a high-conductivity, CTE-matched thermal bridge from the active epi to the baseplate — lowering junction temperatures and boosting PA lifetime.
Photonics
By engineering heat flow at wafer level, WaLTIS™ turns wavelength stability into a given, not a gamble.
Power Conversion
From server racks to electric vehicles, WaLTIS™ unlocks cooler, more compact, and more reliable wide-bandgap power conversion. Built for high-density PSUs, SiC inverters, and automotive OBCs looking to push performance boundaries.
Engineered substrate for hotspot relief
WaLTIS directly targets the die-to-substrate bottleneck, lowering junction temperature and smoothing mechanical stress where GaN, GaAs, InP and SiC devices run hottest.
Front-end neutral, Back-end friendly integration
WaLTIS integrates after device fabrication, preserving existing SiC/GaN wafer lines while fitting seamlessly into today’s die-attach, DBC, and module assembly flows.
Flexible Across Platforms and Process Flows
WaLTIS integrates with varied device types and manufacturing routes, enabling high-performance substrates without altering upstream designs or downstream assembly.
