CoolSem’s patented wafer-level thermal management technology helps chips run cooler, last longer, and perform beyond today’s limits.
CoolSem’s patented wafer-level thermal management technology helps chips run cooler, last longer, and perform beyond today’s limits.
Scroll to discover
Learn more about our mission


Watch how our team works on this mission


While traditional cooling techniques remove heat from the package or system level, the real challenge lies deeper.
In the thermal resistance of the chip’s substrate.



Active device

Substrate

heatsink
As devices cycle through temperature changes, the different materials inside each chip expand and contract at different rates — adding mechanical stress on top of thermal resistance. Over time, this stress degrades interfaces and compounds the very heat problem it’s meant to control.


Our wafer based solution
CoolSem removes the substrate, the barrier to efficient heat flow.
And we replace it with our patented wafer-level carrier that conducts heat up to 15× better.


Active Devices

Substrate

Waltis ®
Our patented WaLTIS® wafer-level technology reduces thermal resistance by up to 15× and eliminates hotspots that degrade device performance and reliability. At the same time, the architecture remains dielectrically neutral — fully compatible with existing device layouts and electrical isolation schemes.




WaLTIS directly targets the die-to-substrate bottleneck, lowering junction temperature and smoothing mechanical stress where GaN, GaAs, InP and SiC devices run hottest.
WaLTIS integrates after device fabrication, preserving existing SiC/GaN wafer lines while fitting seamlessly into today’s die-attach, DBC, and module assembly flows.
WaLTIS integrates with varied device types and manufacturing routes, enabling high-performance substrates without altering upstream designs or downstream assembly.
CoolSem works close to the active device layer, where heat is generated and where the first thermal bottlenecks often arise. Instead of only adding cooling capacity at package or system level, CoolSem improves the device-level thermal path itself. This increases the effectiveness of the entire cooling set-up, gives designers more freedom and helps system integrators reduce thermal complexity and total cost of ownership.
CoolSem develops wafer-level thermal solutions for semiconductor and photonic devices. Our WaLTIS technology replaces the original device substrate with a proprietary engineered substrate that improves heat removal while helping to manage coefficient of thermal expansion (CTE) mismatch between the device layer and the next level in the assembly. The result is a more effective and mechanically robust thermal path, supporting better performance, efficiency, reliability and lifetime.